International Journal of Thin Film Science and Technology
Abstract
Chemical bath deposition technique has many advantages if compared to other deposition methods. This deposition technique is simple, inexpensive and convenient for large area deposition at low temperature as highlighted by many researchers. In this work, binary, ternary, and quaternary thin films have been produced by using this technique. An extensive survey of thin films synthesized during the past twenty years (2000 to 2020) is reported. The properties of thin films such as structural, optical, compositional, morphological and electrical were described based on literature review.
Recommended Citation
Soonmin, Ho
(2021)
"Deposition of Metal Sulphide Thin Films by Chemical Bath Deposition Technique: Review,"
International Journal of Thin Film Science and Technology: Vol. 10
:
Iss.
1
, PP -.
Available at:
https://digitalcommons.aaru.edu.jo/ijtfst/vol10/iss1/7