Nano thin film coating procedure by DC sputtering technique has been reviewed, investigated, and evaluated by using different materials and device parameters in recent years. This report focuses on device factors that affect the thickness of nano-thin films for optical and optic-electric applications. These parameters including time, temperature, power, pressure, and flow rate of gases. The review provides more understanding meaning of the coating procedure by DC sputtering process.
Jassim Jawad, Akram
"Recent Developments in Coating Procedure by Using Direct Current (DC) Sputtering for Optical-Medical Applications,"
International Journal of Thin Film Science and Technology: Vol. 10
, Article 12.
Available at: https://digitalcommons.aaru.edu.jo/ijtfst/vol10/iss3/12