International Journal of Thin Film Science and Technology
Magnetization Behaviour of Nanocrystalline Permalloy Thin Films Prepared Using Oblique-angle Magnetron Sputtering Technique
In the current work, nanocrystalline Fe0.5Ni0.5 magnetic thin films were deposited on a Si(100) substrate using the oblique-angle sputtering technique with the oblique deposition angle ranging from 11.5 to 45°. Structure, static magnetic properties, and dynamic magnetic characteristics were evaluated as a function of the deposition angle. The results indicate that the nanocrystalline FCC phase of FeNi with (111) preferred orientation and the average crystallite size of 6.3-9.3 nm was deposited successfully. The measured value of the uniaxial anisotropy field shows an increment from 7.65 to 16.71 Oe as the oblique angle rises from 11.5 to 45°, which in turn leads to an increase in the ferromagnetic resonance frequency from 0.63 to 0.88 GHz.
Gheisari, Kh. and K. Ong, C.
"Magnetization Behaviour of Nanocrystalline Permalloy Thin Films Prepared Using Oblique-angle Magnetron Sputtering Technique,"
International Journal of Thin Film Science and Technology: Vol. 11
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Available at: https://digitalcommons.aaru.edu.jo/ijtfst/vol11/iss3/6