Magnetization Behaviour of Nanocrystalline Permalloy Thin Films Prepared Using Oblique-angle Magnetron Sputtering Technique

Authors

Kh. Gheisari, Department of Materials Science and Engineering, Faculty of Engineering, Shahid Chamran University of Ahvaz, Ahvaz, Iran.Follow
C. K. Ong, Center for Superconducting and Magnetic Materials, Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542.Follow

Abstract

In the current work, nanocrystalline Fe0.5Ni0.5 magnetic thin films were deposited on a Si(100) substrate using the oblique-angle sputtering technique with the oblique deposition angle ranging from 11.5 to 45°. Structure, static magnetic properties, and dynamic magnetic characteristics were evaluated as a function of the deposition angle. The results indicate that the nanocrystalline FCC phase of FeNi with (111) preferred orientation and the average crystallite size of 6.3-9.3 nm was deposited successfully. The measured value of the uniaxial anisotropy field shows an increment from 7.65 to 16.71 Oe as the oblique angle rises from 11.5 to 45°, which in turn leads to an increase in the ferromagnetic resonance frequency from 0.63 to 0.88 GHz.

Recommended Citation

Gheisari, Kh. and K. Ong, C. (2022) "Magnetization Behaviour of Nanocrystalline Permalloy Thin Films Prepared Using Oblique-angle Magnetron Sputtering Technique," International Journal of Thin Film Science and Technology: Vol. 11 : Iss. 3 , PP -.
Available at: https://digitalcommons.aaru.edu.jo/ijtfst/vol11/iss3/6