Optimization of Deposition Parameters on the Physical Properties of TiO2 Thin Films by Spray Pyrolysis Technique

Authors

A. Gowri Manohari, Department of Physics, Annamalai University, Annamalai Nagar – 608 002, IndiaFollow
S. Dhanapandian, Department of Physics, Annamalai University, Annamalai Nagar – 608 002, IndiaFollow
K. Santhosh Kumar, Department of Physics, Annamalai University, Annamalai Nagar – 608 002, IndiaFollow
T. Mahalingam, Department of Electrical and Computer Engineering, Ajou University, Suwon – 443 749, South KoreaFollow

Abstract

Titanium dioxide (TiO2) thin films have been deposited on microscopic glass substrate by spray pyrolysis technique. The effect of deposition parameters such as substrate temperature, molarity (precursor concentration) and solution spray rate on the structural, surface morphological and optical properties of the films have been studied. The prepared films were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM) with EDS and UV-Vis spectroscopy. The XRD patterns indicated that the films have amorphous and polycrystalline structure and the size of the crystallites have been changed from 9 to 48 nm. The optical band gap of the TiO2 films is determined to be about 3.40 to 3.65 eV to the change of deposition conditions.

Recommended Citation

Gowri Manohari, A.; Dhanapandian, S.; Santhosh Kumar, K.; and Mahalingam, T. (2014) "Optimization of Deposition Parameters on the Physical Properties of TiO2 Thin Films by Spray Pyrolysis Technique," International Journal of Thin Film Science and Technology: Vol. 3 : Iss. 1 , PP -.
Available at: https://digitalcommons.aaru.edu.jo/ijtfst/vol3/iss1/1