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International Journal of Thin Film Science and Technology

International Journal of Thin Film Science and Technology

Abstract

CuIn2n+1S3n+2 (where n = 0, 1, 2, 3 and 5) thin films were deposited at different substrate temperatures (30, 75, 100, 150 and 200 ◦C) by vacuum evaporation. The films were characterized for their structural properties by using X-ray diffraction (XRD). From the XRD data, we calculated the grain size, the lattice strain, the lattice parameters and the dislocation density for the preferential orientation of CuIn2n+1S3n+2 thin films. The effect of the substrate temperature on the structural crystalline quality of the films was also investigated.

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