Nanocrystalline CoNiW thin films were synthesized by electrodeposition method. The CoNiW thin films have been coated on the copper substrate by applying a constant current of 7.5 mA for 15 minutes. The CoNiW coated thin films were subjected to various characterization techniques like EDAX, XRD, SEM and Vickers hardness test. EDAX investigation gives the chemical composition of the coated films. The Co content of 75.37 wt%, Ni content of 13.67 wt% and 10.96 wt% of W were determined from EDAX analysis. The surface morphology of the coated film is analyzed by using SEM photographs. X- ray diffraction showed that the existence of nanocrystalline phase of CoNiW. The average crystalline size of CoNiW thin films were calculated from XRD is in the range of 34 nm. The Vickers hardness of 105 VHN while applying the load of 25 g. The electroplated CoNiW thin films were strongly adherent to the substrate. This was observed from bend and scratch test.
Kannan, R. and Kokila, S.
"Synthesis and Structural Characterization of CoNiW alloy Thin Films by Electrodeposition.,"
International Journal of Thin Film Science and Technology: Vol. 4
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Available at: https://digitalcommons.aaru.edu.jo/ijtfst/vol4/iss1/8