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International Journal of Thin Film Science and Technology

International Journal of Thin Film Science and Technology

Abstract

Herein we examine the effect of formaldehyde on chromium electrodeposits obtained from trivalent chromium electrolytes containing urea and formic acid as complexing agents. Indigenous experimental set up was made using platinized titanium as anode and mild steel as cathode. The ensuing physico-chemical properties of the deposits were characterized and analyzed by different characterization techniques such as XRD, SEM, EDAX and FT-IR. Corrosion measurements such as Tafel polarization and AC impedance spectroscopy were carried out in 0.2M H2SO4. These studies revealed that chromium electrodeposits obtained from the electrolyte containing 100 ppm of formaldehyde, showed the good corrosion resistance property towards acidic solution. The electrocrystallization of chromium during electrodeposition favored by the presence of formaldehyde resulted in chromium deposits of nano scale. i.e. 23 nm. EDAX analysis revealed the elemental composition of obtained electrodeposits. The bond formation between formaldehyde and chromium metal was established by FT-IR studies.

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