Choice of a Substrate for PdxNi1-x Thin Films used as Hydrogen Sensors

Authors

M. K. Loudjani, Institut de Chimie Moléculaire et des Matériaux dOrsay (ICMMO)- UMR 8182, Equipe Synthèse, Propriétés et Modélisation des Matériaux (SP2M), Université Paris Sud - Bât 410, Bur. 350, 15 rue Georges Clémenceau, 91405 Orsay Cedex – France.Follow

Abstract

In this work we studied the effect of the order at the interface of a Pd20Ni80 thin film deposited on different substrates on the electric resistance (R) thin film. We analyzed the fluctuations of the electric resistance (R) of Pd20Ni80 thin film after 1000 measurements. The relative error of the electric resistance (R/R) of a Pd20Ni80 thin film is minimal when the surface of the substrate is ordered, obtained with an -alumina single crystal substrate, while this ratio presents a strong drift in the absence of order at the interface when the substrate used is an amorphous silica glass. After 1000 measurements at strong current (I = 50 mA), the mean relative error of the electric resistance of the Ni80Pd20 films deposited on an -alumina single crystal is 33 times weaker than the relative error of the electric resistance obtained for the same film deposited on silica glass.

Recommended Citation

K. Loudjani, M. (2016) "Choice of a Substrate for PdxNi1-x Thin Films used as Hydrogen Sensors," International Journal of Thin Film Science and Technology: Vol. 5 : Iss. 3 , PP -.
Available at: https://digitalcommons.aaru.edu.jo/ijtfst/vol5/iss3/4