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International Journal of Thin Film Science and Technology

International Journal of Thin Film Science and Technology

Abstract

Pd element has been deposited on the clean surface of an Al-Pd-Mn quasicrystal by evaporation and using low energy ion scattering (LEIS) technique. The sample was prepared through a combination of sputtering and annealing. Then a Pd monolayer was deposited on the surface and measured the ratio of Al/Pd for clean annealed surface at the room temperature. Drawing the Al/Pd ratio versus time deposition showed a linear behavior, indicating Pd growth is Layer Growth (Frank-Van der-Merwe Growth). Similar experiment for Al has also been done. Results show that growth of Al on the sample is also conform Layer Growth (LG)

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