International Journal of Thin Film Science and Technology
Abstract
Pd element has been deposited on the clean surface of an Al-Pd-Mn quasicrystal by evaporation and using low energy ion scattering (LEIS) technique. The sample was prepared through a combination of sputtering and annealing. Then a Pd monolayer was deposited on the surface and measured the ratio of Al/Pd for clean annealed surface at the room temperature. Drawing the Al/Pd ratio versus time deposition showed a linear behavior, indicating Pd growth is Layer Growth (Frank-Van der-Merwe Growth). Similar experiment for Al has also been done. Results show that growth of Al on the sample is also conform Layer Growth (LG)
Recommended Citation
Kiani, Maryam and Samavat, Feridoun
(2018)
"Al, Pd Elements Deposited on the Surface of Al-Pd-Mn Quasicrystal,"
International Journal of Thin Film Science and Technology: Vol. 7
:
Iss.
1
, PP -.
Available at:
https://digitalcommons.aaru.edu.jo/ijtfst/vol7/iss1/2