International Journal of Thin Film Science and Technology
Abstract
Thin films of tungsten oxide were deposited on glass substrates at different temperatures and O2/Ar ratios using DC Magnetron sputtering system. The samples were characterized using x-ray diffractometry and spectrophotometer structurally and optically respectively. Analysis of the results reveals dependence of structure on thickness and temperature. The O2/Ar ratio is also found to influence the optical properties appreciably for the entire wavelength range studied. Visual inspection of the films show that O2/Ar ratio influences the coloration of the film which varies from clear to dark blue for high to low O2/Ar ratios respectively.
Recommended Citation
Mkirema Maghanga, Christopher
(2018)
"Influence of Deposition Parameters on Optical Properties of Sputtered Tungsten Oxide Films,"
International Journal of Thin Film Science and Technology: Vol. 7
:
Iss.
2
, PP -.
Available at:
https://digitalcommons.aaru.edu.jo/ijtfst/vol7/iss2/2