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International Journal of Thin Film Science and Technology

International Journal of Thin Film Science and Technology

Abstract

Undoped and lithium doped nickel oxide (Li doped NiO) thin films have been prepared onto glass substrates at 450 °C by chemical spray pyrolysis technique. The effect of lithium (Li) concentrations on the structural, optical, photoluminescence and electrical properties of the Li doped NiO films were studied by X-ray diffraction (XRD), UV-vis- NIR spectrophotometer, Photoluminescence (PL) spectrophotometer, Hot probe and Hall effect measurement system. The PL results confirmed that the band gap reduces when the lithium concentration increases. The structural properties of undoped and Li doped NiO films showed polycrystalline cubic structure. The optical transmittance and band gap values of the films decreases, while the absorption values increases with the increase in Li concentration. Moreover, it has been observed that the resistivity of the above films decreases with the increase in Li concentration.

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