The study aims to estimate the extent to which the reflection wave is affected by the initial stress, magnetic field, and fractional parameter within a semiconductor photothermal diffusion medium when taking into account the Classical (CT) theory and the dual-phase-lag (DPL) theory. Its problem is defined in examining the generalized framework concerning plasma, thermoelastic waves under the thermomechanical responding of reflecting the photothermal diffusion for the semiconductor constituent. It applies the Maxwells equations while considering the absence of the medium of infinite conducting and displacement current. Moreover, it applies the boundary settings for the Maxwells and mechanical stress, diffusion, chemical reaction, as well as temperature gradient on the interface next to the vacuum. It obtains analytically and displays graphically the ratios of the reflection coefficient as tasks of the angle of incidence, diffusion, initial stress, magnetic field, semiconducting, and photothermal. It compares the CT to the DPL theory. It also compares its findings to the results of the literature. The results of the paper include generalizing the photothermal semiconductor medium and deducing to a special case when neglecting the novel parameters. When neglecting the magnetic field, fractional parameter, and initial stress, the findings of the current study deduce to the findings of Lotfy et al. (2020) as a special case of study.
S. Gafel, Hanan
"Fractional Order Study of the Impact of a Photo Thermal Wave on a Semiconducting Medium under Magnetic Field and Thermoplastic Theories,"
Information Sciences Letters: Vol. 11
, PP -.
Available at: https://digitalcommons.aaru.edu.jo/isl/vol11/iss2/62